Electroless Plating Solution for Forming Metal Films on Inert Substrates (Case No. 2026-211)

Summary:

UCLA researchers in the Department of Chemistry & Biochemistry have developed a novel electroless plating solution that facilitates metal deposition on inert polymers without conventional pre-treatment.

Background:

Metal thin films deposited on inert polymer substrates are critical components in wearable electronics, sensors, and flexible electrodes. To create high purity and uniform polymer-metal thin-film composites, chemical vapor deposition (CVD) and physical vapor deposition (PVD) are utilized. While capable of producing high-quality films, these techniques typically require vacuum systems, elevated temperatures, and capital-intensive equipment, limiting compatibility with flexible substrates and increasing manufacturing costs. Electroless plating has shown promise as a solution-based technique that enables metal film deposition on chemically inert substrates via redox reactions, without the need for an external current. Despite this, electroless plating has significant limitations. Sensitization, a critical step in deposition, relies on acidic tin-based solutions which raise environmental and health concerns, an issue of particular relevance in wearable electronics. In addition, activation, a pre-treatment process in electroless plating, utilizes increasingly costly noble metals, which poses economic limitations for large-scale implementation. Thus, there is a need for an alternative electroless plating process that mitigates health risks while improving scalability and cost-effectiveness.

Innovation:

Researchers at UCLA have developed an electroless plating solution capable of forming metal thin films on chemically inert substrates without the use of traditional sensitization and activation techniques. This formulation enables copper deposition on PI and PET films without the need for toxic tin sensitization or noble metal activation reagents. This methodology significantly simplifies the production of polymer-metal thin-film composites and compresses the processing timeline, as functional films form within minutes. The system’s wide applicability is driven by a facile salt metathesis protocol, which allows for the deposition of many metals using standard solutions. The system can accommodate most transition metal ions used in industrial thin films while maintaining conventional film formation characteristics. Furthermore, the system minimizes the deleterious surface wetting issues found in aqueous solutions, enabling uniform plating on hydrophobic plastics and glass. The technology provides precise control over surface morphology, ensuring that prolonged plating time leads to smooth and uniform surfaces. In conclusion, this methodology provides a precise and widely applicable framework that improves the production of polymer-metal thin-film composites by simplifying the process and improving scalability.

Potential Applications:

●    Flexible Electronics and Circuits
     ○    Wearable biosensors
●    EMI/RFI Shielding
●    Advanced Sensors
●    Microfluidics
●    Aerospace and defense 
●    Automotive materials
●    Any application where thin layers of copper are desired

Advantages:

●    Simplified pre-treatment
     ○    Cost effectiveness
●    Non-Toxic Reagents
●    Rapid processing
●    Scalability
●    Controllable thickness of applied metal films

Development-To-Date:

Compound developed; validation in progress.

Related Papers:

●    Nava, Matthew., et al. “Metal–Ligand Cooperativity Enables Zero-Valent Metal Transfer.” Chemical Science, vol. 16, 2025, pp. 3888–3894. Royal Society of Chemistry, https://doi.org/10.1039/D4SC07938H

Reference:

UCLA Case No. 2026-211

Lead Inventors:

Matthew Nava, Oliver Garcia
 

Patent Information:
For More Information:
Ed Beres
edward.beres@tdg.ucla.edu
Inventors:
Matthew Nava
Oliver Garcia