Search Results - rani+ghaida

1 Results

Sort By:

2010-241 Single-Mask Double-Patterning Lithography

Summary: UCLA researchers in the Department of Electrical and Computer Engineering have developed a shift-trim double-patterning lithography (ST-DPL) technique to improve the manufacturing of microprocessors and allow for densely-featured patterns. Background: Photolithography is a common method used for the production of various electrical materials...

Published: 8/1/2023 | Inventor(s): Puneet Gupta, Rani Ghaida

Keywords(s):

Category(s): Electrical, Electrical > Electronics & Semiconductors, Materials, Materials > Semiconducting Materials, Electrical > Electronics & Semiconductors > Memory