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2010-241 Single-Mask Double-Patterning Lithography

Summary: UCLA researchers in the Department of Electrical and Computer Engineering have developed a shift-trim double-patterning lithography (ST-DPL) technique to improve the manufacturing of microprocessors and allow for densely-featured patterns. Background: Photolithography is a common method used for the production of various electrical materials...

Published: 10/7/2024 | Inventor(s): Puneet Gupta, Rani Ghaida

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Category(s): Electrical, Electrical > Electronics & Semiconductors, Materials, Materials > Semiconducting Materials, Electrical > Electronics & Semiconductors > Memory